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Atomic layer deposition of hafnium based gate dielectric layers for CMOS applications
Publication:
Atomic layer deposition of hafnium based gate dielectric layers for CMOS applications
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Date
2007
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Delabie, Annelies
;
Nyns, Laura
;
Bellenger, Florence
;
Caymax, Matty
;
Conard, Thierry
;
Franquet, Alexis
;
Houssa, Michel
;
Lin, Dennis
;
Meuris, Marc
;
Ragnarsson, Lars-Ake
;
Sioncke, Sonja
;
Swerts, Johan
;
Fedorenko, Yanina
;
Maes, Jan
;
Van Elshocht, Sven
;
De Gendt, Stefan
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1996
since deposited on 2021-10-16
Acq. date: 2025-12-10
Citations
Metrics
Views
1996
since deposited on 2021-10-16
Acq. date: 2025-12-10
Citations