dc.contributor.author | Demand, Marc | |
dc.contributor.author | Paraschiv, Vasile | |
dc.contributor.author | Shamiryan, Denis | |
dc.contributor.author | Vrancken, Christa | |
dc.contributor.author | Brus, Stephan | |
dc.contributor.author | Veloso, Anabela | |
dc.contributor.author | Boullart, Werner | |
dc.date.accessioned | 2021-10-16T15:45:33Z | |
dc.date.available | 2021-10-16T15:45:33Z | |
dc.date.issued | 2007 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/12042 | |
dc.source | IIOimport | |
dc.title | Dry etch of Yb-doped poly-Si gates for low Vt FUSI devices | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Demand, Marc | |
dc.contributor.imecauthor | Paraschiv, Vasile | |
dc.contributor.imecauthor | Vrancken, Christa | |
dc.contributor.imecauthor | Brus, Stephan | |
dc.contributor.imecauthor | Veloso, Anabela | |
dc.contributor.imecauthor | Boullart, Werner | |
dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
dc.source.peerreview | yes | |
dc.source.conference | Plasma Etch and Strip in Microelectronics | |
dc.source.conferencedate | 10/09/2007 | |
dc.source.conferencelocation | Leuven Belgium | |
imec.availability | Published - imec | |