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Simulation of the combined effects of polymer size, acid diffusion length, and EUV secondary electron blur on resist line-edge roughness

dc.contributor.authorDrygianakis, D.
dc.contributor.authorNijkerk, M.D.
dc.contributor.authorPatsis, G.P.
dc.contributor.authorKokkoris, G.
dc.contributor.authorRaptis, I.
dc.contributor.authorLeunissen, Peter
dc.contributor.authorGogolides, E.
dc.date.accessioned2021-10-16T15:57:01Z
dc.date.available2021-10-16T15:57:01Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12104
dc.sourceIIOimport
dc.titleSimulation of the combined effects of polymer size, acid diffusion length, and EUV secondary electron blur on resist line-edge roughness
dc.typeProceedings paper
dc.source.peerreviewno
dc.source.beginpage65193T
dc.source.conferenceAdvances in Resist Materials and Processing Technology XXIV
dc.source.conferencedate25/02/2007
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesSPIE Proc.; Vol. 6519


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