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Simulation of the combined effects of polymer size, acid diffusion length, and EUV secondary electron blur on resist line-edge roughness
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Authors
Drygianakis, D.
;
Nijkerk, M.D.
;
Patsis, G.P.
;
Kokkoris, G.
;
Raptis, I.
;
Leunissen, Peter
;
Gogolides, E.
Conference
Advances in Resist Materials and Processing Technology XXIV
Title
Simulation of the combined effects of polymer size, acid diffusion length, and EUV secondary electron blur on resist line-edge roughness
Publication type
Proceedings paper
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