Publication:

Atomic layer deposition as an enabling technology for fabrication of germanium MOS transistor

Date

2007

Presentation

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Author(s)

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Delabie, Annelies

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Van Elshocht, Sven

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De Jaeger, Brice

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Nicholas, Gareth

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Zimmerman, Paul

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Pourtois, Geoffrey

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Winderickx, Gillis

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Huyghebaert, Cedric

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Terzieva, Valentina

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Metrics

2019 since deposited on 2021-10-16

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Acq. date: 2026-01-11