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Atomic layer deposition as an enabling technology for fabrication of germanium MOS transistor

dc.contributor.authorEneman, Geert
dc.contributor.authorDelabie, Annelies
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorDe Jaeger, Brice
dc.contributor.authorNicholas, Gareth
dc.contributor.authorMartens, Koen
dc.contributor.authorBrunco, David
dc.contributor.authorZimmerman, Paul
dc.contributor.authorHoussa, Michel
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorKaczer, Ben
dc.contributor.authorLeys, Frederik
dc.contributor.authorWinderickx, Gillis
dc.contributor.authorHuyghebaert, Cedric
dc.contributor.authorTerzieva, Valentina
dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-16T16:00:49Z
dc.date.available2021-10-16T16:00:49Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12123
dc.sourceIIOimport
dc.titleAtomic layer deposition as an enabling technology for fabrication of germanium MOS transistor
dc.typeOral presentation
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorDe Jaeger, Brice
dc.contributor.imecauthorMartens, Koen
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorWinderickx, Gillis
dc.contributor.imecauthorHuyghebaert, Cedric
dc.contributor.imecauthorTerzieva, Valentina
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecDe Jaeger, Brice::0000-0001-8804-7556
dc.contributor.orcidimecMartens, Koen::0000-0001-7135-5536
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecHuyghebaert, Cedric::0000-0001-6043-7130
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.source.peerreviewno
dc.source.conference7th International Conference Atomic Layer Deposition Conference - ALD
dc.source.conferencedate25/06/2007
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - imec


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