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dc.contributor.authorFoubert, Philippe
dc.contributor.authorKocsis, Michael
dc.contributor.authorGronheid, Roel
dc.contributor.authorKishimura, Shinji
dc.contributor.authorSoyano, Akimasa
dc.contributor.authorNafus, Kathleen
dc.contributor.authorStepanenko, Nickolay
dc.contributor.authorDe Backer, Johan
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorErcken, Monique
dc.date.accessioned2021-10-16T16:09:42Z
dc.date.available2021-10-16T16:09:42Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12165
dc.sourceIIOimport
dc.titleMeasurement and evaluation of water uptake by resists, top coats and stacks and correlation with watermark defects
dc.typeProceedings paper
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorKocsis, Michael
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorDe Backer, Johan
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorErcken, Monique
dc.source.peerreviewno
dc.source.beginpage65190E
dc.source.conferenceAdvances in Resist Materials and Processing Technology XXIV
dc.source.conferencedate25/02/2007
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesSPIE Proc., Vol. 6519


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