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Conference contributions
Characterization of post-etched photoresist and residues by various analytical techniques
Publication:
Characterization of post-etched photoresist and residues by various analytical techniques
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Date
2007-11
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Franquet, Alexis
;
Claes, Martine
;
Conard, Thierry
;
Kesters, Els
;
Vereecke, Guy
;
Vandervorst, Wilfried
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1866
since deposited on 2021-10-16
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last month
Acq. date: 2026-01-07
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Metrics
Views
1866
since deposited on 2021-10-16
4
last month
Acq. date: 2026-01-07
Citations