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Characterization of post-etched photoresist and residues by various analytical techniques

dc.contributor.authorFranquet, Alexis
dc.contributor.authorClaes, Martine
dc.contributor.authorConard, Thierry
dc.contributor.authorKesters, Els
dc.contributor.authorVereecke, Guy
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-16T16:10:44Z
dc.date.available2021-10-16T16:10:44Z
dc.date.issued2007-11
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12170
dc.sourceIIOimport
dc.titleCharacterization of post-etched photoresist and residues by various analytical techniques
dc.typeMeeting abstract
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.source.peerreviewno
dc.source.conferenceSIMS XVI - 16th International Conference on Secondary Ion Mass Spectrometry
dc.source.conferencedate29/10/2007
dc.source.conferencelocationKanazawa Japan
imec.availabilityPublished - imec


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