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Optimisation methodology towards a manufacturable 0.3 μm poly-gate process using i-line lithography

dc.contributor.authorFinders, Jo
dc.contributor.authorBruggeman, B.
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan den hove, Luc
dc.contributor.authorTzviatkov, Plamen
dc.contributor.authorDusa, M.
dc.date.accessioned2021-09-29T14:29:03Z
dc.date.available2021-09-29T14:29:03Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1221
dc.sourceIIOimport
dc.titleOptimisation methodology towards a manufacturable 0.3 μm poly-gate process using i-line lithography
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage223
dc.source.endpage246
dc.source.conferenceProceedings of the Microlithography Seminar INTERFACE
dc.source.conferencedate27/10/1996
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - imec


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