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Laser annealed junctions: process integration sequence optimization for advanced CMOS technologies

dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.authorNoda, Taiji
dc.contributor.authorFelch, S.
dc.contributor.authorSeveri, Simone
dc.contributor.authorParihar, V.
dc.contributor.authorForstner, H.
dc.contributor.authorVrancken, Christa
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorVan Daele, Benny
dc.contributor.authorBender, Hugo
dc.contributor.authorNiwa, Masaaki
dc.contributor.authorSchreutelkamp, Rob
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorBiesemans, Serge
dc.contributor.authorAbsil, Philippe
dc.date.accessioned2021-10-16T16:41:26Z
dc.date.available2021-10-16T16:41:26Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12301
dc.sourceIIOimport
dc.titleLaser annealed junctions: process integration sequence optimization for advanced CMOS technologies
dc.typeProceedings paper
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.imecauthorAbsil, Philippe
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage137
dc.source.endpage140
dc.source.conferenceExtended Abstracts of the 7th International Workshop on Junction Technology
dc.source.conferencedate8/06/2007
dc.source.conferencelocationKyoto Japan
imec.availabilityPublished - open access


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