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Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future

dc.contributor.authorJonckheere, Rik
dc.contributor.authorLorusso, Gian
dc.contributor.authorGoethals, Mieke
dc.contributor.authorRonse, Kurt
dc.contributor.authorHermans, Jan
dc.contributor.authorDe Ruyter, Rudi
dc.date.accessioned2021-10-16T16:58:51Z
dc.date.available2021-10-16T16:58:51Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12369
dc.sourceIIOimport
dc.titleAssessment of EUV reticle blank availability enabling the use of EUV tools today and in the future
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorDe Ruyter, Rudi
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage653313
dc.source.conference23rd European Mask and Lithography Conference - EMLC
dc.source.conferencedate23/01/2007
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol. 6533


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