AVD and MOCVD TaCN-based films for gate metal applications on high-k gate dielectrics

Thumbnail
Metadata
Show full item record
Authors
Karim, Zia; Barbar, Ghassan; Boissiere, Olivier; Lehnen, Peer; Lohe, Christoph; Seidel, Tom; Adelmann, Christoph; Conard, Thierry; O'Sullivan, Barry; Ragnarsson, Lars-Ake; Schram, Tom; Van Elshocht, Sven; De Gendt, Stefan
Conference
Physics and Technology of High-k Dielectrics
Title
AVD and MOCVD TaCN-based films for gate metal applications on high-k gate dielectrics
Publication type
Proceedings paper
Collections