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AVD and MOCVD TaCN-based films for gate metal applications on high-k gate dielectrics

dc.contributor.authorKarim, Zia
dc.contributor.authorBarbar, Ghassan
dc.contributor.authorBoissiere, Olivier
dc.contributor.authorLehnen, Peer
dc.contributor.authorLohe, Christoph
dc.contributor.authorSeidel, Tom
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorConard, Thierry
dc.contributor.authorO'Sullivan, Barry
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorSchram, Tom
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-16T17:03:20Z
dc.date.available2021-10-16T17:03:20Z
dc.date.issued2007-10
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12386
dc.sourceIIOimport
dc.titleAVD and MOCVD TaCN-based films for gate metal applications on high-k gate dielectrics
dc.typeProceedings paper
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorO'Sullivan, Barry
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecO'Sullivan, Barry::0000-0002-9036-8241
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpage557
dc.source.endpage567
dc.source.conferencePhysics and Technology of High-k Dielectrics
dc.source.conferencedate7/10/2007
dc.source.conferencelocationWashington, DC USA
dc.identifier.urlhttp://www.ecsdl.org/vsearch/servlet/VerityServlet?KEY=ECSTF8&smode=strresults&sort=rel&maxdisp=25&threshold=0&pjournals=ECSTF8&
imec.availabilityPublished - imec
imec.internalnotesECS Trans.; Vol. 11; Issue 4


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