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Characterization of post-etch photoresists used in metal hardmask and photoresist mask patterning schemes

dc.contributor.authorKesters, Els
dc.contributor.authorClaes, Martine
dc.contributor.authorLux, Marcel
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorVereecke, Guy
dc.contributor.authorFranquet, Alexis
dc.contributor.authorConard, Thierry
dc.contributor.authorMertens, Paul
dc.contributor.authorAdriaensens, Peter
dc.contributor.authorCarleer, Robert
dc.contributor.authorBiebuyck, J.J.
dc.contributor.authorVan Veltem, P.
dc.contributor.authorBebelman, Sabine
dc.date.accessioned2021-10-16T17:04:55Z
dc.date.available2021-10-16T17:04:55Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12392
dc.sourceIIOimport
dc.titleCharacterization of post-etch photoresists used in metal hardmask and photoresist mask patterning schemes
dc.typeOral presentation
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorAdriaensens, Peter
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.source.peerreviewno
dc.source.conference1st International Workshop Plasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate10/09/2007
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - imec


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