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Effects of plasma chemistry on low-k film properties

dc.contributor.authorKim, Dongchan
dc.contributor.authorUrbanowicz, Adam
dc.contributor.authorMannaert, Geert
dc.contributor.authorStruyf, Herbert
dc.contributor.authorMin, K. J.
dc.contributor.authorKang, C. J.
dc.contributor.authorMoon, J. T.
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-16T17:06:30Z
dc.date.available2021-10-16T17:06:30Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12398
dc.sourceIIOimport
dc.titleEffects of plasma chemistry on low-k film properties
dc.typeProceedings paper
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorStruyf, Herbert
dc.source.peerreviewno
dc.source.conference29th International Symposium on Dry Process - DPS
dc.source.conferencedate13/11/2007
dc.source.conferencelocationTokyo Japan
imec.availabilityPublished - imec
imec.internalnoteshttp://www.dps2007.org/


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