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Widening of FUSI RTP process window by spike anneal

dc.contributor.authorLauwers, Anne
dc.contributor.authorMertens, Sofie
dc.contributor.authorAbsil, Philippe
dc.contributor.authorChiarella, Thomas
dc.contributor.authorHoffmann, Thomas
dc.contributor.authorKubicek, Stefan
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorBrijs, Bert
dc.contributor.authorVrancken, Christa
dc.contributor.authorBiesemans, Serge
dc.contributor.authorKittl, Jorge
dc.contributor.authorVerheyden, Kurt
dc.contributor.authorVanormelingen, Koen
dc.contributor.authorGranneman, Ernst
dc.date.accessioned2021-10-16T17:20:42Z
dc.date.available2021-10-16T17:20:42Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12451
dc.sourceIIOimport
dc.titleWidening of FUSI RTP process window by spike anneal
dc.typeProceedings paper
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorMertens, Sofie
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.orcidimecMertens, Sofie::0000-0002-1482-6730
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.source.peerreviewno
dc.source.beginpage111
dc.source.endpage117
dc.source.conference15th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP
dc.source.conferencedate2/10/2007
dc.source.conferencelocationCatania Sicily
imec.availabilityPublished - imec


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