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Etching of thermal SiO2 in supercritical CO2

dc.contributor.authorMalhouitre, Stephane
dc.contributor.authorVan Hoeymissen, Jan
dc.contributor.authorCase, Carlye
dc.contributor.authorGranger, Pascal
dc.date.accessioned2021-10-16T17:47:08Z
dc.date.available2021-10-16T17:47:08Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12543
dc.sourceIIOimport
dc.titleEtching of thermal SiO2 in supercritical CO2
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage71
dc.source.endpage78
dc.source.conferenceCleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10
dc.source.conferencedate7/10/2007
dc.source.conferencelocationWashington, DC USA
imec.availabilityPublished - open access
imec.internalnotesECS Trans.; Vol.11, nr.2


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