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The impact of ultra thin ALD TiN metal gate on low frequency noise of CMOS transistors

dc.contributor.authorMercha, Abdelkarim
dc.contributor.authorSinganamalla, Raghunath
dc.contributor.authorSubramanian, Vaidy
dc.contributor.authorSimoen, Eddy
dc.contributor.authorSansen, Willy
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorDe Meyer, Kristin
dc.contributor.authorDecoutere, Stefaan
dc.date.accessioned2021-10-16T17:55:35Z
dc.date.available2021-10-16T17:55:35Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12571
dc.sourceIIOimport
dc.titleThe impact of ultra thin ALD TiN metal gate on low frequency noise of CMOS transistors
dc.typeProceedings paper
dc.contributor.imecauthorMercha, Abdelkarim
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.orcidimecMercha, Abdelkarim::0000-0002-2174-6958
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.source.peerreviewyes
dc.source.beginpage33
dc.source.endpage38
dc.source.conferenceNoise and Fluctuations, 19th International Conference
dc.source.conferencedate9/09/2007
dc.source.conferencelocationTokyo Japan
imec.availabilityPublished - imec
imec.internalnotesAIP Conference Proceedings; CP922


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