Lithography and yield sensitivity analysis of SRAM scaling for the 32-nm node.

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Authors
Nackaerts, Axel; Verhaegen, Staf; Dusa, Mircea; Kattouw, Hans; van Bilsen, Frank; Biesemans, Serge; Vandenberghe, Geert
Conference
Design for Manufacturability through Design-Process Integration
Title
Lithography and yield sensitivity analysis of SRAM scaling for the 32-nm node.
Publication type
Proceedings paper
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