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Lithography and yield sensitivity analysis of SRAM scaling for the 32-nm node.

dc.contributor.authorNackaerts, Axel
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorDusa, Mircea
dc.contributor.authorKattouw, Hans
dc.contributor.authorvan Bilsen, Frank
dc.contributor.authorBiesemans, Serge
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-16T18:06:27Z
dc.date.available2021-10-16T18:06:27Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12606
dc.sourceIIOimport
dc.titleLithography and yield sensitivity analysis of SRAM scaling for the 32-nm node.
dc.typeProceedings paper
dc.contributor.imecauthorDusa, Mircea
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.imecauthorVandenberghe, Geert
dc.source.peerreviewno
dc.source.beginpage65210N
dc.source.conferenceDesign for Manufacturability through Design-Process Integration
dc.source.conferencedate28/02/2007
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesSPIE Proceedings; Vol.6521


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