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Hierarchical E-beam proximity correction in mask making

dc.contributor.authorHofmann, U.
dc.contributor.authorKalus, C.
dc.contributor.authorRosenbusch, A.
dc.contributor.authorJonckheere, Rik
dc.contributor.authorHourd, A.
dc.date.accessioned2021-09-29T14:34:05Z
dc.date.available2021-09-29T14:34:05Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1261
dc.sourceIIOimport
dc.titleHierarchical E-beam proximity correction in mask making
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage150
dc.source.endpage158
dc.source.conferenceElectrtron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI
dc.source.conferencedate11/03/1996
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 2723


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