Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Conference contributions
Stress in silicon due to the formation of self aligned poly-CoSi2 lines studied by micro-Raman spectroscopy
Publication:
Stress in silicon due to the formation of self aligned poly-CoSi2 lines studied by micro-Raman spectroscopy
Copy permalink
Date
1996
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
1240.pdf
352.39 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Howard, Dave
;
De Wolf, Ingrid
;
Bender, Hugo
;
Maex, Karen
Journal
Abstract
Description
Metrics
Views
1909
since deposited on 2021-09-29
Acq. date: 2026-01-06
Citations
Metrics
Views
1909
since deposited on 2021-09-29
Acq. date: 2026-01-06
Citations