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Line width dependent mobility in high-k – a comparative performance study between FUSI and TiN

dc.contributor.authorPantisano, Luigi
dc.contributor.authorTrojman, Lionel
dc.contributor.authorSeveri, Simone
dc.contributor.authorSan Andres Serrano, Enrique
dc.contributor.authorKerner, Christoph
dc.contributor.authorVeloso, Anabela
dc.contributor.authorFerain, Isabelle
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-16T18:26:47Z
dc.date.available2021-10-16T18:26:47Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12669
dc.sourceIIOimport
dc.titleLine width dependent mobility in high-k – a comparative performance study between FUSI and TiN
dc.typeProceedings paper
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorKerner, Christoph
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecGroeseneken, Guido::0000-0003-3763-2098
dc.source.peerreviewno
dc.source.beginpage38
dc.source.endpage39
dc.source.conferenceInternational Symposium on VLSI Technology, Systems, and Applications - VLSI-TSA
dc.source.conferencedate23/05/2007
dc.source.conferencelocationHsin-Chu Taiwan
imec.availabilityPublished - imec


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