dc.contributor.author | Hurd, Trace | |
dc.contributor.author | Schmidt, Harald | |
dc.contributor.author | Rotondaro, Antonio | |
dc.contributor.author | Mertens, Paul | |
dc.contributor.author | Hall, L. H. | |
dc.contributor.author | Heyns, Marc | |
dc.date.accessioned | 2021-09-29T14:34:48Z | |
dc.date.available | 2021-09-29T14:34:48Z | |
dc.date.issued | 1996 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/1266 | |
dc.source | IIOimport | |
dc.title | Metal interactions with silica (SiO2) surfaces: adsorption and ion exchange | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Mertens, Paul | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 277 | |
dc.source.endpage | 283 | |
dc.source.conference | Proceedings of the Fourth International Symposium on Cleaning technology in Semiconductor Device Manufacturing | |
dc.source.conferencedate | 9/10/1995 | |
dc.source.conferencelocation | Chicago, IL USA | |
imec.availability | Published - open access | |
imec.internalnotes | ECS Proceedings; Vol. 95-20 | |