NBTI reliability of Ni FUSI/HfSiON gates: effect of silicide phase

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Authors

Shickova, Adelina; Kaczer, Ben; Veloso, Anabela; Aoulaiche, Marc; Houssa, Michel; Maes, Herman; Groeseneken, Guido; Kittl, Jorge

Issue

4_5

Journal

Microelectronics Reliability

Volume

47

Title

NBTI reliability of Ni FUSI/HfSiON gates: effect of silicide phase

Publication type

Journal article

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