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Post-etch cleaning after dry etching the emitter windows to improve the bipolar characteristics in a 0.5 µm BiCMOS technology

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2055 since deposited on 2021-09-29
3last month
Acq. date: 2026-04-25

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2055 since deposited on 2021-09-29
3last month
Acq. date: 2026-04-25

Citations