Publication:
Post-etch cleaning after dry etching the emitter windows to improve the bipolar characteristics in a 0.5 µm BiCMOS technology
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2051 since deposited on 2021-09-29
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Acq. date: 2025-12-23
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2051 since deposited on 2021-09-29
1last month
1last week
Acq. date: 2025-12-23
Citations