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Effective work-function modulation by aluminum-ion implantation for metal-gate technology (poly-Si/TiN/SiO2)
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Authors
Singanamalla, Raghunath
;
Yu, HongYu
;
Van Daele, Benny
;
Kubicek, Stefan
;
De Meyer, Kristin
Issue
12
Journal
IEEE Electron Device Letters
Volume
28
Title
Effective work-function modulation by aluminum-ion implantation for metal-gate technology (poly-Si/TiN/SiO2)
Publication type
Journal article
Embargo date
9999-12-31
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