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Damage reduction and sealing of low-k films by combined He and NH3 plasma treatment
Publication:
Damage reduction and sealing of low-k films by combined He and NH3 plasma treatment
Date
2007
Journal article
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Urbanowicz, Adam
;
Baklanov, Mikhaïl
;
Heijlen, Jeroen
;
Travaly, Youssef
;
Cockburn, Andrew
Journal
Electrochemical and Solid-State Letters
Abstract
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2014
since deposited on 2021-10-16
Acq. date: 2025-10-24
Citations
Metrics
Views
2014
since deposited on 2021-10-16
Acq. date: 2025-10-24
Citations