Damage reduction and sealing of low-k films by combined He and NH3 plasma treatment

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Authors

Urbanowicz, Adam; Baklanov, Mikhaïl; Heijlen, Jeroen; Travaly, Youssef; Cockburn, Andrew

Issue

10

Journal

Electrochemical and Solid-State Letters

Volume

10

Title

Damage reduction and sealing of low-k films by combined He and NH3 plasma treatment

Publication type

Journal article

Embargo date

9999-12-31

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