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Damage reduction and sealing of low-k films by combined He and NH3 plasma treatment
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Damage reduction and sealing of low-k films by combined He and NH3 plasma treatment
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Date
2007
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Urbanowicz, Adam
;
Baklanov, Mikhaïl
;
Heijlen, Jeroen
;
Travaly, Youssef
;
Cockburn, Andrew
Journal
Electrochemical and Solid-State Letters
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2019
since deposited on 2021-10-16
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Acq. date: 2026-01-09
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Views
2019
since deposited on 2021-10-16
1
last month
1
last week
Acq. date: 2026-01-09
Citations