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Highly manufacturable FinFETs with sub-10nm fin width and high aspect ratio fabricated with immersion lithography

dc.contributor.authorVan Dal, Mark
dc.contributor.authorCollaert, Nadine
dc.contributor.authorDoornbos, Gerben
dc.contributor.authorVellianitis, Georgios
dc.contributor.authorCuratola, Gilberto
dc.contributor.authorPawlak, Bartek
dc.contributor.authorDuffy, Ray
dc.contributor.authorJonville, Carole
dc.contributor.authorDegroote, Bart
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorKunnen, Eddy
dc.contributor.authorDemand, Marc
dc.contributor.authorBeckx, Stephan
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorDelvaux, Christie
dc.contributor.authorLeys, Frederik
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorRooyackers, Rita
dc.contributor.authorKaiser, M.
dc.contributor.authorWeemaes, R.G.R.
dc.contributor.authorBiesemans, Serge
dc.contributor.authorJurczak, Gosia
dc.contributor.authorKottantharayil, Anil
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorLander, Rob
dc.date.accessioned2021-10-16T20:29:09Z
dc.date.available2021-10-16T20:29:09Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13026
dc.sourceIIOimport
dc.titleHighly manufacturable FinFETs with sub-10nm fin width and high aspect ratio fabricated with immersion lithography
dc.typeProceedings paper
dc.contributor.imecauthorVan Dal, Mark
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorDoornbos, Gerben
dc.contributor.imecauthorVellianitis, Georgios
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.source.peerreviewno
dc.source.beginpage110
dc.source.endpage111
dc.source.conferenceSymposium on VLSI Technology. Digest of Technical Papers
dc.source.conferencedate14/06/2007
dc.source.conferencelocationKyoto
imec.availabilityPublished - imec


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