Publication:

Highly manufacturable FinFETs with sub-10nm fin width and high aspect ratio fabricated with immersion lithography

Date

2007
Proceedings Paper
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Author(s)

Van Dal, Mark  
;
Collaert, Nadine  
;
Doornbos, Gerben  
;
Vellianitis, Georgios  
;
Curatola, Gilberto
;
Pawlak, Bartek  
;
Duffy, Ray
;
Jonville, Carole
;
Degroote, Bart
;
Altamirano Sanchez, Efrain  
;
Kunnen, Eddy
;
Demand, Marc  
;
Beckx, Stephan  
;
Vandeweyer, Tom  
;
Delvaux, Christie  
;
Leys, Frederik
;
Hikavyy, Andriy  
;
Rooyackers, Rita
;
Kaiser, M.
;
Weemaes, R.G.R.
;
Biesemans, Serge  
;
Jurczak, Gosia  
;
Kottantharayil, Anil
;
Witters, Liesbeth  
;
Lander, Rob

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