Publication:
Highly manufacturable FinFETs with sub-10nm fin width and high aspect ratio fabricated with immersion lithography
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1964 since deposited on 2021-10-16
3last month
1last week
Acq. date: 2026-01-09
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Metrics
Views
1964 since deposited on 2021-10-16
3last month
1last week
Acq. date: 2026-01-09
Citations