Publication:
Highly manufacturable FinFETs with sub-10nm fin width and high aspect ratio fabricated with immersion lithography
Date
| dc.contributor.author | Van Dal, Mark | |
| dc.contributor.author | Collaert, Nadine | |
| dc.contributor.author | Doornbos, Gerben | |
| dc.contributor.author | Vellianitis, Georgios | |
| dc.contributor.author | Curatola, Gilberto | |
| dc.contributor.author | Pawlak, Bartek | |
| dc.contributor.author | Duffy, Ray | |
| dc.contributor.author | Jonville, Carole | |
| dc.contributor.author | Degroote, Bart | |
| dc.contributor.author | Altamirano Sanchez, Efrain | |
| dc.contributor.author | Kunnen, Eddy | |
| dc.contributor.author | Demand, Marc | |
| dc.contributor.author | Beckx, Stephan | |
| dc.contributor.author | Vandeweyer, Tom | |
| dc.contributor.author | Delvaux, Christie | |
| dc.contributor.author | Leys, Frederik | |
| dc.contributor.author | Hikavyy, Andriy | |
| dc.contributor.author | Rooyackers, Rita | |
| dc.contributor.author | Kaiser, M. | |
| dc.contributor.author | Weemaes, R.G.R. | |
| dc.contributor.imecauthor | Van Dal, Mark | |
| dc.contributor.imecauthor | Collaert, Nadine | |
| dc.contributor.imecauthor | Doornbos, Gerben | |
| dc.contributor.imecauthor | Vellianitis, Georgios | |
| dc.contributor.imecauthor | Pawlak, Bartek | |
| dc.contributor.imecauthor | Altamirano Sanchez, Efrain | |
| dc.contributor.imecauthor | Demand, Marc | |
| dc.contributor.imecauthor | Beckx, Stephan | |
| dc.contributor.imecauthor | Vandeweyer, Tom | |
| dc.contributor.imecauthor | Delvaux, Christie | |
| dc.contributor.imecauthor | Hikavyy, Andriy | |
| dc.contributor.imecauthor | Biesemans, Serge | |
| dc.contributor.imecauthor | Jurczak, Gosia | |
| dc.contributor.imecauthor | Witters, Liesbeth | |
| dc.contributor.orcidimec | Collaert, Nadine::0000-0002-8062-3165 | |
| dc.contributor.orcidimec | Hikavyy, Andriy::0000-0002-8201-075X | |
| dc.date.accessioned | 2021-10-16T20:29:09Z | |
| dc.date.available | 2021-10-16T20:29:09Z | |
| dc.date.issued | 2007 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13026 | |
| dc.source.beginpage | 110 | |
| dc.source.conference | Symposium on VLSI Technology. Digest of Technical Papers | |
| dc.source.conferencedate | 14/06/2007 | |
| dc.source.conferencelocation | Kyoto | |
| dc.source.endpage | 111 | |
| dc.title | Highly manufacturable FinFETs with sub-10nm fin width and high aspect ratio fabricated with immersion lithography | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: | ||