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Work function (WF) simulations of Ta/HfO2, Ta2C/HfO2 and Ta2C/La2O3/HfO2 capped high-k stacks

dc.contributor.authorVan der Heyden, Nikolaas
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorStesmans, Andre
dc.date.accessioned2021-10-16T20:34:27Z
dc.date.available2021-10-16T20:34:27Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13041
dc.sourceIIOimport
dc.titleWork function (WF) simulations of Ta/HfO2, Ta2C/HfO2 and Ta2C/La2O3/HfO2 capped high-k stacks
dc.typeProceedings paper
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorStesmans, Andre
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage135
dc.source.endpage143
dc.source.conferencePhysics and Technology of High-k Dielectrics
dc.source.conferencedate7/10/2007
dc.source.conferencelocationWashington, DC USA
imec.availabilityPublished - open access
imec.internalnotesECS Trans.; Vol. 11; iss. 4


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