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dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorHardy, An
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorCaymax, Matty
dc.contributor.authorConard, Thierry
dc.contributor.authorFranquet, Alexis
dc.contributor.authorRichard, Olivier
dc.contributor.authorVan Bael, Marlies
dc.contributor.authorMullens, J.
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-16T20:37:13Z
dc.date.available2021-10-16T20:37:13Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13048
dc.sourceIIOimport
dc.titleScreening of high-k layers in MIS and MIM capacitors using aqueous chemical solution deposition
dc.typeProceedings paper
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorHardy, An
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVan Bael, Marlies
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecVan Bael, Marlies::0000-0002-5516-7962
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage299
dc.source.endpage310
dc.source.conferencePhysics and Technology of High-K Dielectrics
dc.source.conferencedate7/10/2007
dc.source.conferencelocationWashington, DC USA
imec.availabilityPublished - open access
imec.internalnotesECS Trans.; Vol. 11, iss. 4


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