dc.contributor.author | Van Olmen, Jan | |
dc.contributor.author | Al-Bayati, A | |
dc.contributor.author | Beyer, Gerald | |
dc.contributor.author | Boelen, Pieter | |
dc.contributor.author | Carbonell, Laure | |
dc.contributor.author | Zhao, Chao | |
dc.contributor.author | Ciofi, Ivan | |
dc.contributor.author | Claes, Martine | |
dc.contributor.author | Cockburn, Andrew | |
dc.contributor.author | Druais, Gael | |
dc.contributor.author | Hendrickx, Dirk | |
dc.contributor.author | Heylen, Nancy | |
dc.contributor.author | Kesters, Els | |
dc.contributor.author | Lytle, S. | |
dc.contributor.author | Noori, A. | |
dc.contributor.author | Op de Beeck, Maaike | |
dc.contributor.author | Struyf, Herbert | |
dc.contributor.author | Tokei, Zsolt | |
dc.contributor.author | Versluijs, Janko | |
dc.date.accessioned | 2021-10-16T20:48:28Z | |
dc.date.available | 2021-10-16T20:48:28Z | |
dc.date.issued | 2007 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13079 | |
dc.source | IIOimport | |
dc.title | Integration of 50 nm half pitch single damascene copper trenches in BDII by means of double patterning 193 nm immersion lithography on metal hardmask | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Van Olmen, Jan | |
dc.contributor.imecauthor | Beyer, Gerald | |
dc.contributor.imecauthor | Ciofi, Ivan | |
dc.contributor.imecauthor | Claes, Martine | |
dc.contributor.imecauthor | Cockburn, Andrew | |
dc.contributor.imecauthor | Hendrickx, Dirk | |
dc.contributor.imecauthor | Heylen, Nancy | |
dc.contributor.imecauthor | Kesters, Els | |
dc.contributor.imecauthor | Op de Beeck, Maaike | |
dc.contributor.imecauthor | Struyf, Herbert | |
dc.contributor.imecauthor | Tokei, Zsolt | |
dc.contributor.imecauthor | Versluijs, Janko | |
dc.contributor.orcidimec | Ciofi, Ivan::0000-0003-1374-4116 | |
dc.contributor.orcidimec | Op de Beeck, Maaike::0000-0002-2700-6432 | |
dc.source.peerreview | no | |
dc.source.conference | Advanced Metallization Conference - AMC | |
dc.source.conferencedate | 9/10/2007 | |
dc.source.conferencelocation | Albany, NY USA | |
imec.availability | Published - imec | |