Achieving Low-VT Ni-FUSI CMOS by ultra-thin Dy2O3 capping of hafnium silicate dielectrics

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Authors

Veloso, Anabela; Yu, HongYu; Chang, S.Z.; Adelmann, Chris; Onsia, Bart; Brus, Stephan

Issue

11

Journal

IEEE Electron Device Letters

Volume

28

Title

Achieving Low-VT Ni-FUSI CMOS by ultra-thin Dy2O3 capping of hafnium silicate dielectrics

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Journal article

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