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Sub-32nm half pitch imaging with high NA immersion exposure systems using Double Patterning techniques
Publication:
Sub-32nm half pitch imaging with high NA immersion exposure systems using Double Patterning techniques
Date
2007
Presentation
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vleeming, Bert
;
Maenhoudt, Mireille
;
Quaedackers, John
;
van der Heijden, Eddy
;
de Haas, Paul
;
Uzunbajakau, Siarhei
;
Meessen, Jeroen
;
Dicker, Gerald
;
Finders, Jo
;
Dusa, Mircea
;
Jaenen, Patrick
;
Locorotondo, Sabrina
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Abstract
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1924
since deposited on 2021-10-16
417
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Acq. date: 2025-10-25
Citations
Metrics
Views
1924
since deposited on 2021-10-16
417
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations