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Sub-32nm half pitch imaging with high NA immersion exposure systems using Double Patterning techniques
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Authors
Vleeming, Bert
;
Maenhoudt, Mireille
;
Quaedackers, John
;
van der Heijden, Eddy
;
de Haas, Paul
;
Uzunbajakau, Siarhei
;
Meessen, Jeroen
;
Dicker, Gerald
;
Finders, Jo
;
Dusa, Mircea
;
Jaenen, Patrick
;
Locorotondo, Sabrina
Conference
4th International Symposium on Immersion Lithography
Title
Sub-32nm half pitch imaging with high NA immersion exposure systems using Double Patterning techniques
Publication type
Oral presentation
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