dc.contributor.author | Vleeming, Bert | |
dc.contributor.author | Maenhoudt, Mireille | |
dc.contributor.author | Quaedackers, John | |
dc.contributor.author | van der Heijden, Eddy | |
dc.contributor.author | de Haas, Paul | |
dc.contributor.author | Uzunbajakau, Siarhei | |
dc.contributor.author | Meessen, Jeroen | |
dc.contributor.author | Dicker, Gerald | |
dc.contributor.author | Finders, Jo | |
dc.contributor.author | Dusa, Mircea | |
dc.contributor.author | Jaenen, Patrick | |
dc.contributor.author | Locorotondo, Sabrina | |
dc.date.accessioned | 2021-10-16T21:30:46Z | |
dc.date.available | 2021-10-16T21:30:46Z | |
dc.date.issued | 2007 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13193 | |
dc.source | IIOimport | |
dc.title | Sub-32nm half pitch imaging with high NA immersion exposure systems using Double Patterning techniques | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Dusa, Mircea | |
dc.contributor.imecauthor | Jaenen, Patrick | |
dc.contributor.imecauthor | Locorotondo, Sabrina | |
dc.source.peerreview | no | |
dc.source.conference | 4th International Symposium on Immersion Lithography | |
dc.source.conferencedate | 9/10/2007 | |
dc.source.conferencelocation | Keystone, CO USA | |
imec.availability | Published - imec | |