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Sub-32nm half pitch imaging with high NA immersion exposure systems using Double Patterning techniques

dc.contributor.authorVleeming, Bert
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorQuaedackers, John
dc.contributor.authorvan der Heijden, Eddy
dc.contributor.authorde Haas, Paul
dc.contributor.authorUzunbajakau, Siarhei
dc.contributor.authorMeessen, Jeroen
dc.contributor.authorDicker, Gerald
dc.contributor.authorFinders, Jo
dc.contributor.authorDusa, Mircea
dc.contributor.authorJaenen, Patrick
dc.contributor.authorLocorotondo, Sabrina
dc.date.accessioned2021-10-16T21:30:46Z
dc.date.available2021-10-16T21:30:46Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13193
dc.sourceIIOimport
dc.titleSub-32nm half pitch imaging with high NA immersion exposure systems using Double Patterning techniques
dc.typeOral presentation
dc.contributor.imecauthorDusa, Mircea
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorLocorotondo, Sabrina
dc.source.peerreviewno
dc.source.conference4th International Symposium on Immersion Lithography
dc.source.conferencedate9/10/2007
dc.source.conferencelocationKeystone, CO USA
imec.availabilityPublished - imec


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