A novel concept for contact etch residue removal

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Authors
Vos, Ingrid; Hellin, David; Demuynck, Steven; Richard, Olivier; Conard, Thierry; Vertommen, Johan; Boullart, Werner
Conference
Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10
Title
A novel concept for contact etch residue removal
Publication type
Proceedings paper
Embargo date
9999-12-31
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