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Practical solutions to enhance EWF tunability of Ni FUSI gate electrode on HfO2

dc.contributor.authorWang, X.P.
dc.contributor.authorYang, J.J.
dc.contributor.authorChen, J.D.
dc.contributor.authorXie, R.L.
dc.contributor.authorLi, M.-F.
dc.contributor.authorZhu, C.X.
dc.contributor.authorYu, HongYu
dc.contributor.authorDu, A.Y.
dc.contributor.authorLim, P.C.
dc.contributor.authorLim, Andy
dc.contributor.authorMi, Y.Y.
dc.contributor.authorLai, Doreen M.Y.
dc.contributor.authorLoh, W.Y.
dc.contributor.authorBiesemans, Serge
dc.contributor.authorLo, G.Q.
dc.contributor.authorKwong, D.-L.
dc.date.accessioned2021-10-16T21:39:38Z
dc.date.available2021-10-16T21:39:38Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13214
dc.sourceIIOimport
dc.titlePractical solutions to enhance EWF tunability of Ni FUSI gate electrode on HfO2
dc.typeProceedings paper
dc.contributor.imecauthorBiesemans, Serge
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage854
dc.source.endpage855
dc.source.conferenceInternational Conference on Solid State Devices and Materials - SSDM
dc.source.conferencedate18/09/2007
dc.source.conferencelocationKyoto Japan
imec.availabilityPublished - open access


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