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A study in interactions of plasmas and wet cleans with ULK materials

dc.contributor.authorXu, Kaidong
dc.contributor.authorVereecke, Guy
dc.contributor.authorKesters, Els
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorLux, Marcel
dc.contributor.authorKraus, Harald
dc.contributor.authorHenry, Sally - Ann
dc.contributor.authorArcher, L.
dc.contributor.authorGaulhofer, E.
dc.contributor.authorKovacs, F.
dc.contributor.authorDalmer, M.
dc.contributor.authorMertens, Paul
dc.contributor.authorLuo, S. J
dc.contributor.authorHan, Q. Y
dc.date.accessioned2021-10-16T21:50:15Z
dc.date.available2021-10-16T21:50:15Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13241
dc.sourceIIOimport
dc.titleA study in interactions of plasmas and wet cleans with ULK materials
dc.typeProceedings paper
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference1st International Workshop Plasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate10/09/2007
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - open access


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