Properties of ALD HfTaxOy high-k layers deposited on chemical silicon oxide

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Authors

Zhao, Chao; Witters, Thomas; Breimer, P.; Maes, Jan; Caymax, Matty; De Gendt, Stefan

Issue

1

Journal

Microelectronic Engineering

Volume

84

Title

Properties of ALD HfTaxOy high-k layers deposited on chemical silicon oxide

Publication type

Journal article

Embargo date

9999-12-31

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