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High velocity aerosol cleaning with organic solvents: particle removal and substrate damage

dc.contributor.authorAndreas, Michael
dc.contributor.authorWostyn, Kurt
dc.contributor.authorWada, Masayuki
dc.contributor.authorJanssens, Tom
dc.contributor.authorKenis, Karine
dc.contributor.authorBearda, Twan
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-17T06:13:41Z
dc.date.available2021-10-17T06:13:41Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13301
dc.sourceIIOimport
dc.titleHigh velocity aerosol cleaning with organic solvents: particle removal and substrate damage
dc.typeOral presentation
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.source.peerreviewno
dc.source.conference9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSS
dc.source.conferencedate21/09/2008
dc.source.conferencelocationBrugge Belgium
imec.availabilityPublished - imec


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