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DUV resist profile improvement on TiN deposited metal layer

dc.contributor.authorLin, Chia-Hui
dc.contributor.authorChen, Chun-Ho
dc.contributor.authorJenq, Jhy-Sayang
dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-29T14:43:38Z
dc.date.available2021-09-29T14:43:38Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1330
dc.sourceIIOimport
dc.titleDUV resist profile improvement on TiN deposited metal layer
dc.typeProceedings paper
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage427
dc.source.endpage436
dc.source.conferenceOptical Microlithography IX
dc.source.conferencedate13/03/1996
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 2726


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