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Results of low-frequency noise in submicron nMOSFETs processed by a 0.35mm CMOS technology

dc.contributor.authorLukyanchikova, N. B.
dc.contributor.authorPetrichuk, M. V.
dc.contributor.authorGarbar, N. P.
dc.contributor.authorSimoen, Eddy
dc.contributor.authorClaeys, Cor
dc.date.accessioned2021-09-29T14:43:55Z
dc.date.available2021-09-29T14:43:55Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1332
dc.sourceIIOimport
dc.titleResults of low-frequency noise in submicron nMOSFETs processed by a 0.35mm CMOS technology
dc.typeProceedings paper
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage150
dc.source.endpage155
dc.source.conferenceProceedings 3rd ELEN Workshop
dc.source.conferencedate5/11/1996
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - open access


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