dc.contributor.author | Beccera, Loic | |
dc.contributor.author | Baboux, Nicolas | |
dc.contributor.author | Plossu, Carole | |
dc.contributor.author | Merckling, Clement | |
dc.contributor.author | El-Kazzi, Mario | |
dc.contributor.author | Saint-Girons, Guillaume | |
dc.contributor.author | Vilquin, Bertrand | |
dc.contributor.author | Hollinger, Guy | |
dc.date.accessioned | 2021-10-17T06:16:16Z | |
dc.date.available | 2021-10-17T06:16:16Z | |
dc.date.issued | 2008 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13360 | |
dc.source | IIOimport | |
dc.title | Strategies for CMOS low equivalent oxide thickness achievement with high-k oxides grown on Si(001) by MBE | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Merckling, Clement | |
dc.contributor.orcidimec | Merckling, Clement::0000-0003-3084-2543 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 1073-H3-08 | |
dc.source.conference | Materials Science of High-k Dielectric Stackx - From Fundamentals to Technology | |
dc.source.conferencedate | 24/03/2008 | |
dc.source.conferencelocation | San Francisco, CA USA | |
imec.availability | Published - imec | |
imec.internalnotes | MRS Symposium Proceedings; Vol. 1073E | |