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60nm half pitch contact layer printing: exploring the limits at 1.35NA lithography

dc.contributor.authorBekaert, Joost
dc.contributor.authorHendrickx, Eric
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-17T06:16:23Z
dc.date.available2021-10-17T06:16:23Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13362
dc.sourceIIOimport
dc.title60nm half pitch contact layer printing: exploring the limits at 1.35NA lithography
dc.typeProceedings paper
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage69243A
dc.source.conferenceOptical Microlithography XXI
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; vol. 6924


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