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Passivation of (100)Ge/GeO2/high-k gate stacks using thermal oxide treatments
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Passivation of (100)Ge/GeO2/high-k gate stacks using thermal oxide treatments
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Date
2008
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Bellenger, Florence
;
Houssa, Michel
;
Delabie, Annelies
;
Afanasiev, Valeri
;
Conard, Thierry
;
Caymax, Matty
;
Meuris, Marc
;
De Meyer, Kristin
;
Heyns, Marc
Journal
Journal of the Electrochemical Society
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1835
since deposited on 2021-10-17
Acq. date: 2025-12-16
Citations
Metrics
Views
1835
since deposited on 2021-10-17
Acq. date: 2025-12-16
Citations