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Implementation of Ru based barriers in 50 nm half pitch single damascene Cu/SiCOH (k=2.5) structures

dc.contributor.authorCarbonell, Laure
dc.contributor.authorVolders, Henny
dc.contributor.authorHeylen, Nancy
dc.contributor.authorKellens, Kristof
dc.contributor.authorTokei, Zsolt
dc.contributor.authorHendrickx, Dirk
dc.contributor.authorStruyf, Herbert
dc.contributor.authorVandervorst, Alain
dc.contributor.authorClaes, Martine
dc.contributor.authorLux, Marcel
dc.contributor.authorVersluijs, Janko
dc.contributor.authorAlaerts, Wilfried
dc.contributor.authorVan Besien, Els
dc.contributor.authorDeweerdt, Bruno
dc.contributor.authorVaes, Jan
dc.contributor.authorCaluwaerts, Rudy
dc.contributor.authorCockburn, Andrew
dc.contributor.authorGravey, Virginie
dc.contributor.authorShah, Kavita
dc.contributor.authorAl-Bayati, A.
dc.contributor.authorFu, X.
dc.contributor.authorLubben, D.
dc.contributor.authorSundarrajan, A.
dc.contributor.authorBeyer, Gerald
dc.date.accessioned2021-10-17T06:26:10Z
dc.date.available2021-10-17T06:26:10Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13473
dc.sourceIIOimport
dc.titleImplementation of Ru based barriers in 50 nm half pitch single damascene Cu/SiCOH (k=2.5) structures
dc.typeMeeting abstract
dc.contributor.imecauthorVolders, Henny
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.imecauthorKellens, Kristof
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorHendrickx, Dirk
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorAlaerts, Wilfried
dc.contributor.imecauthorVan Besien, Els
dc.contributor.imecauthorDeweerdt, Bruno
dc.contributor.imecauthorCaluwaerts, Rudy
dc.contributor.imecauthorCockburn, Andrew
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecVan Besien, Els::0000-0002-5174-2229
dc.source.peerreviewno
dc.source.conferenceAdvanced Metallization Conference - AMC
dc.source.conferencedate23/09/2008
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - imec


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